Workshop on Direct Optical Lithography for Advanced Opto- and Microelectronics
Workshop on Direct Optical Lithography for Advanced Opto- and Microelectronics
This workshop will explore cutting-edge advances in lithography techniques crucial for the development of micro-, nano-, and optoelectronic devices, as well as sensor technologies. Traditional photolithography using photomasks has proven to be rigid and costly, especially during the research and prototyping phases. In contrast, maskless photolithography, including laser (UV) and nanoprobe methods, offers greater flexibility and precision, enabling researchers to directly structure materials and modify device architectures with ease.
Date
Wednesday, November 6, 2024
SuBMITION
Contributions to the workshop should be made via the general SPO 2014 submission form. All related research will be assigned to the workshop sessions by the Program Committee.
Maskless lithography has been applied to various advanced applications, including the structuring of quantum dot films, development of contact electrodes for 2D materials, and the enhancement of infrared detector performance. This technique promises to revolutionize fabrication processes, allowing for rapid prototyping and the creation of complex 3D optical structures.
Ukraine is investing in the development of these technologies through the establishment of a State Key Laboratory focused on critical optoelectronic micro- and nanotechnologies at the V. Lashkaryov Institute of Semiconductor Physics. The workshop will provide a platform for researchers, engineers, and students to engage with these new methodologies and explore their potential in advancing the electronics industry.
TopicS
- Maskless Lithography: Flexible laser and nanoprobe methods.
- Applications: Quantum dots, 2D materials, IR detectors.
- Prototyping: Rapid 3D structure development.
- Cleanroom Facilities: High-precision fabrication environments.
ORGANIZERS AND PARTNERS
